磁控濺射系統(tǒng)

The next generation Magnetron Sputtering Deposition system, is practical, inexpensive, expandable and highly reliable, ushering in the future of research.

The Magnetron Sputtering System is compley customizable. The chamber can be designed to accept additional evaporation sources, and unused ports are blocked off with flanges to allow future additions.

Additions can include Magnetron Guns, a Thermal Resistance source or Electron Beam Evaporation. Torr International can produce any custom system you desire. Call to discuss the functionality you require and a system will be designed to fit your process, your budget, and your future.

Electro Polished Stainless Steel Chamber (D shaped Box)

4" Diameter View Port on Front Door with Manual Shutter

Single/Multiple Magnetron Gun Assemblies with Various Target Sizes

Manual Shutter Assembly for All Sources

DC / RF Sputtering Deposition

Turbo Molecular Vacuum Pumping System with Matching Dual Stage Rotary Vane Pump

Quartz Crystal Thickness Sensor with Deposition Controller

Mass Flow Controller with Digital Readout

Full Range Vacuum Gauge with Display & Readout

Easy Target Mounting

Semi-Automatic Controlled System